The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Mar. 23, 2023
International Business Machines Corporation, Armonk, NY (US);
Pouya Hashemi, Purchase, NY (US);
Steven Holmes, Red Hook, NY (US);
Robert L. Bruce, White Plains, NY (US);
Eric A Joseph, Croton on Hudson, NY (US);
Yanning Sun, Scarsdale, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A semiconductor structure includes a first plurality of mandrel structures extending outwardly from a substrate. Each of the first plurality of mandrel structures includes a first side at a first inclination angle with respect to a surface plane of the substrate and a second side at a second inclination angle with respect to the surface plane of the substrate. A second plurality of mandrel structures extend outwardly from the substrate. Each of the second plurality of mandrel structures include a third side at a third inclination angle with respect to the surface plane of the substrate and a fourth side at a fourth inclination angle with respect to the surface plane of the substrate. A template structure for an imprint mask is formed by the first plurality of mandrel structures and the second plurality of mandrel structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile