The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Apr. 23, 2020
Applicant:

Sony Semiconductor Solutions Corporation, Kanagawa, JP;

Inventors:

Nobuyuki Kuboi, Kanagawa, JP;

Koji Eriguchi, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01);
Abstract

A defect density calculation method according to one embodiment of the present disclosure is a method of calculating a temporal change of the defect density distribution in a semiconductor layer. The method includes calculating the temporal change of the defect density distribution on the basis of an arithmetic function using at least the activation energy of a detect included in the semiconductor layer, the processing temperature of the semiconductor layer, and the processing time of the semiconductor layer as arguments.


Find Patent Forward Citations

Kuboi, Nobuyuki. (2026). Defect density calculation method, defect-density calculation program, defect-density calculation apparatus, heat treatment control system and machining control system (U.S. Patent No. 12557601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12557601

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…