The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Mar. 24, 2022
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Yosuke Sakurai, Azumino, JP;

Seiji Noguchi, Matsumoto, JP;

Takashi Yoshimura, Matsumoto, JP;

Hiroshi Takishita, Matsumoto, JP;

Misaki Uchida, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/22 (2006.01); H01L 21/265 (2006.01); H10D 8/00 (2025.01); H10D 12/00 (2025.01); H10D 62/17 (2025.01); H10D 62/53 (2025.01); H10D 84/60 (2025.01);
U.S. Cl.
CPC ...
H01L 21/221 (2013.01); H01L 21/26526 (2013.01); H10D 8/422 (2025.01); H10D 12/481 (2025.01); H10D 62/393 (2025.01); H10D 62/53 (2025.01); H10D 84/617 (2025.01);
Abstract

Provided is a semiconductor device provided with an IGBT, comprising: a semiconductor substrate having upper and lower surfaces, throughout which bulk donors are distributed; a hydrogen peak including a local maximum arranged 25 μm or more away from the lower surface of the semiconductor substrate in a depth direction, at which a hydrogen chemical concentration shows a local maximum value; an upper tail where the hydrogen chemical concentration decreases in a direction from the local maximum toward the upper surface; and a lower tail where the hydrogen chemical concentration decreases in a direction from the local maximum toward the lower surface more gradually than the upper tail; and a first high concentration region having a donor concentration higher than a bulk donor concentration and including a region extending for 4 μm or more in a direction from the local maximum of the hydrogen peak toward the upper surface.


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