The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Jan. 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Yen-Liang Lin, Yilan County, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
Some implementations herein provide a PVD tool that includes a rotational magnet system configured to generate a magnetic field in a processing chamber of the PVD tool. The magnetic field may be used to control the distribution and/or flow of material from a target structure in the processing chamber to a semiconductor substrate in the processing chamber. The rotational magnet system includes a spiral pattern of magnetic pillars on a disc structure. The quantity, spacing, and/or arrangement of the magnetic pillars in the spiral pattern are configured to reduce the likelihood of formation of hot spots in the electromagnetic field in the processing chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile