The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

May. 31, 2021
Applicant:

V Technology Co., Ltd., Yokohama, JP;

Inventors:

Michinobu Mizumura, Yokohama, JP;

Toshinari Arai, Yokohama, JP;

Takanori Matsumoto, Yokohama, JP;

Takuro Takeshita, Yokohama, JP;

Assignee:

V TECHNOLOGY CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/18 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/18 (2013.01); H01J 37/3007 (2013.01);
Abstract

A differential pumping apparatus for creating a high vacuum inside a processing space includes a displacement drive unit configured to move a substrate to be processed or a head, to adjust parallelism and distance between a surface to be processed and a surface of the head. Gap measurement devices are placed at three or more locations along the periphery of the surface of the head to provide distance information. A gap control unit is configured to control the displacement drive unit in response to the distance information between the surface to be processed and the surface adapted to face the surface to be processed, so that the surface to be processed and the surface adapted to face the surface to be processed are parallel.


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