The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2026

Filed:

Mar. 09, 2021
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Weiming Ren, San Jose, CA (US);

Yongxin Wang, San Ramon, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); G01N 23/203 (2006.01); G01N 23/2206 (2018.01); G01N 23/2251 (2018.01); H01J 37/10 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01N 23/203 (2013.01); G01N 23/2206 (2013.01); G01N 23/2251 (2013.01); H01J 37/10 (2013.01); H01J 37/1472 (2013.01); G01N 2223/045 (2013.01); G01N 2223/053 (2013.01); G01N 2223/07 (2013.01); G01N 2223/507 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/2448 (2013.01);
Abstract

Systems and methods of observing a sample using an electron beam apparatus are disclosed. The electron beam apparatus comprises an electron source configured to generate a primary electron beam along a primary optical axis, and a first electron detector having a first detection layer substantially parallel to the primary optical axis and configured to detect a first portion of a plurality of signal electrons generated from a probe spot on a sample. The method may comprise generating a plurality of signal electrons and detecting the signal electrons using the first electron detector substantially parallel to the primary optical axis of the primary electron beam. A method of configuring an electrostatic element or a magnetic element to detect backscattered electrons may include disposing an electron detector on an inner surface of the electrostatic or magnetic element and depositing a conducting layer on the inner surface of the electron detector.


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