The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Feb. 25, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Giuseppe Alessio Verni, Jodoigne, BE;
Ren-Jie Chang, Leuven, BE;
Qi Xie, Wilsele, BE;
Timothee Blanquart, Oud-Heverlee, BE;
Eric Shero, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); H01L 21/02172 (2013.01); H01L 21/02252 (2013.01); H10B 12/03 (2023.02); H10B 12/05 (2023.02); H10B 12/30 (2023.02);
Abstract
Disclosed are methods and systems for depositing layers comprising a metal and nitrogen. The layers are formed onto a surface of a substrate. The deposition process may be a cyclical deposition process. Exemplary structures in which the layers may be incorporated include field effect transistors, VNAND cells, metal-insulator-metal (MIM) structures, and DRAM capacitors.
Alessio Verni, Giuseppe. (2026). Methods and systems for forming a layer comprising vanadium and nitrogen (U.S. Patent No. 12550639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12550639
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile