The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Mar. 14, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chia-Wen Zhong, Taichung, TW;

Yen-Liang Lin, Yilan County, TW;

Yao-Wen Chang, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 70/00 (2023.01); H10B 63/00 (2023.01); H10N 70/20 (2023.01);
U.S. Cl.
CPC ...
H10N 70/8616 (2023.02); H10B 63/30 (2023.02); H10N 70/063 (2023.02); H10N 70/245 (2023.02); H10N 70/841 (2023.02);
Abstract

The present disclosure relates an integrated chip structure. The integrated chip structure includes a bottom electrode disposed within a dielectric structure over a substrate. A top electrode is disposed within the dielectric structure over the bottom electrode. A switching layer and an ion source layer are between the bottom electrode and the top electrode. A barrier structure is between the bottom electrode and the top electrode. The barrier structure includes a metal nitride configured to mitigate a thermal diffusion of metal during a high temperature fabrication process.


Find Patent Forward Citations

Loading…