The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Jan. 11, 2023
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Adam Faust, Rehovot, IL;

Yosef Basson, Mazkeret-Batya, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/02 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/026 (2013.01); H01J 37/20 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/2007 (2013.01);
Abstract

A device for discharging an electrostatic chuck located within a vacuum chamber, the device includes a plasma distribution unit that is configured to receive plasma from an external plasma source that is located outside the vacuum chamber, and perform a distribution of the plasma within the vacuum chamber that discharges the electrostatic chuck. The device also includes a controller for controlling the distribution of the plasma; wherein the distribution of the plasma occurs during a plasma distribution period that is shorter than a duration of a plasma based cleaning process of the electrostatic chuck.


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