The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Dec. 01, 2023
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Klaus Rief, Aalen-Oberalfingen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 7/18 (2021.01); G02B 27/64 (2006.01);
U.S. Cl.
CPC ...
G03F 7/709 (2013.01); G03F 7/70891 (2013.01); G02B 7/1815 (2013.01); G02B 27/646 (2013.01);
Abstract
A projection exposure apparatus for semiconductor lithography includes component having a fluid channel and a device for providing a fluid for flowing through the fluid channel. The fluid channel is connected to the device via a supply line and an outgoing line. The supply line and the outgoing line are connected to one another in parallel with the fluid channel via a short circuit.
Quick Actions:
Rief, Klaus. (2026). Projection exposure apparatus for semiconductor lithography (U.S. Patent No. 12547086). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12547086
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile