The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Aug. 04, 2023
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Marwene Nefzi, Ulm, DE;

Jens Kugler, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); F16F 15/03 (2006.01); F16F 15/04 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/709 (2013.01); F16F 15/03 (2013.01); F16F 15/046 (2013.01); F16F 2222/06 (2013.01); F16F 2228/063 (2013.01); F16F 2228/08 (2013.01);
Abstract

A system for a projection exposure apparatus which comprises a first component, a second component, and a decoupling device configured to decouple the second component in more than one degree of freedom from mechanical excitations of the first component. The decoupling device comprises first decoupling elements which have a positive stiffness. The decoupling device also comprises second decoupling elements, which have a negative stiffness. The decoupling device further comprises a third component, which is arranged between the first and second components.


Find Patent Forward Citations

Nefzi, Marwene. (2026). System and projection exposure apparatus (U.S. Patent No. 12547085). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12547085

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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