The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Aug. 22, 2024
Harbin Institute of Technology, Harbin, CN;
Harbin Institute of Technology, Harbin, CN;
Abstract
This application relates to the technical field of optical precision measurement and discloses a dark-field confocal microscopy measurement apparatus and method based on aperture scanning of vortex illumination. The apparatus includes a vortex illumination generation module, a vortex illumination aperture scanning module, a sample scanning module, and a dark-field lock-in detection module. On one hand, the vortex illumination aperture scanning module enables the light spot focused on the sample to scan a small range of the sample, generating oscillating signals that highlight the scattering signal of nano-scale defects on the sample. On the other hand, highly-sensitive oscillation signal detection is achieved using the dark-field lock-in detection module. In the present disclosure, the small-range aperture scanning of vortex illumination is combined with the dark-field lock-in detection to realize highly-sensitive detection of defects smaller than 50 nm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile