The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Oct. 31, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Dong-Hun Kim, Seoul, KR;

Jun Taek Koo, Seoul, KR;

Myoung Sub Noh, Hwaseong-si, KR;

Dong Sub Oh, Busan, KR;

Assignee:

Semes Co., Ltd., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32917 (2013.01); G02B 27/283 (2013.01); H01J 37/32422 (2013.01); H01J 37/32568 (2013.01);
Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having an inner space; a plate separating the inner space into a first space which is above and a second space which is below and having a plurality of through holes; a first gas supply unit configured to supply a first gas to the first space; a plasma source for generating a plasma at the first space or the second space; and a monitoring unit installed at the plate and configured to monitor a characteristic of the plasma generated at the first space or the second space.


Find Patent Forward Citations

Kim, Dong-Hun. (2026). Apparatus for treating substrate and method for treating substrate (U.S. Patent No. 12542262). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12542262

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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