The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Jul. 11, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Prahallad Iyengar, Santa Clara, CA (US);
Sanjeev Baluja, Campbell, CA (US);
Kartik Shah, Saratoga, CA (US);
Chaowei Wang, San Diego, CA (US);
Janisht Golcha, San Francisco, CA (US);
Eric J. Hoffmann, San Francisco, CA (US);
Joseph Aubuchon, San Jose, CA (US);
Ashutosh Agarwal, San Jose, CA (US);
Lin Sun, Milpitas, CA (US);
Cong Trinh, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Gas injector with a vacuum channel having an inlet opening in the front face and an outlet opening in the back face of the injector are described. The vacuum channel comprises a first leg extending a first length from the inlet opening in the front face at a first angle relative to the front face and a second leg extending a second length from the first leg to the outlet opening in the back face at a second angle relative to the front face. Processing chambers and methods of use comprising a plurality of processing regions bounded around an outer peripheral edge by one or more vacuum channel. A first processing region has a first vacuum channel with a first outer diameter and a second processing region has a second vacuum channel with a second outer diameter, the first outer diameter being less than the second outer diameter.