The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Oct. 26, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Eunhee Jeang, Paju-si, KR;
Boris Afinogenov, Suwon-si, KR;
Sangwoo Bae, Seoul, KR;
Wondon Joo, Seoul, KR;
Maksim Riabko, Suwon-si, KR;
Anton Medvedev, Suwon-si, KR;
Aleksandr Shorokhov, Suwon-si, KR;
Anton Sofronov, Suwon-si, KR;
Ingi Kim, Seoul, KR;
Taehyun Kim, Suwon-si, KR;
Minhwan Seo, Hwaseong-si, KR;
Sangmin Lee, Yongin-si, KR;
Seulgi Lee, Cheongju-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A substrate inspection apparatus includes a light source unit, a pulsed beam matching unit, a substrate support unit, an incidence angle adjusting unit, and a detecting unit. The light source unit emits first and second laser beams. The pulsed beam matching unit matches the first and second laser beams to superimpose a pulse of the first laser beam on a pulse of the second laser beam in time and space. The incidence angle adjusting unit adjusts angles of incidence of the matched first laser beam and second laser beams to irradiate the first laser beam and the second laser beam on the substrate, and mixes the first and second laser beams to generate an evanescent wave on the substrate. The evanescent wave generates scattered light due to a defect of the substrate. The detecting unit detects the scattered light generated due to the defect of the substrate.