The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Aug. 16, 2022
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Wentao Fu, Shanghai, CN;
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Abstract
The present application provides a method for improving plasma distribution in etching, the RF coil is a circular coil composed of four arcs, and the four arcs are sequentially defined as first to fourth arcs; providing a cross support, wherein heads and tails of the first to fourth arcs are separately connected to the cross support; respectively applying different currents to the first to fourth arcs, which are sequentially first to fourth currents, so that different magnetic fields are formed respectively in areas enclosed by the first to fourth arcs and the cross support connected thereto, wherein the magnetic fields corresponding to the first to fourth currents are sequentially first to fourth magnetic fields; and adjusting the magnitudes of the first to fourth currents to change the first to fourth magnetic fields, thereby changing plasma distribution in the different areas.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile