The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Jun. 27, 2024
Tokyo Electron Limited, Tokyo, JP;
Masaki Hirayama, Fuchu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes a chamber, a substrate support, an excitation electrode, and a resonator. The resonator includes an inner side portion and an outer side portion extending coaxially, and conductive plates arranged parallel to each other in a vertical direction. The resonator provides a waveguide path extending between the inner and outer side portions and including a plurality of layers arranged alternately with the conductive plates. Each of the plurality of layers is connected to a layer thereabove at one of a plurality of folded portions along the inner side portion or the outer side portion. A lowermost conductive plate includes a plurality of slots electromagnetically coupled to the discharger. The plurality of slots is arranged in a circumferential direction, and a wall surrounding a lowermost layer in the outer side portion extends along sides of a polygon.