The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
May. 31, 2021
V Technology Co., Ltd., Yokohama, JP;
Michinobu Mizumura, Yokohama, JP;
Toshinari Arai, Yokohama, JP;
Takanori Matsumoto, Yokohama, JP;
Takuro Takeshita, Yokohama, JP;
V TECHNOLOGY CO., LTD., Kanagawa, JP;
Abstract
A process apparatus includes a differential pumping device having a head which has a plurality of annular grooves in a surface which faces a substrate to be processed. An orifice is formed inside an innermost one of the annular grooves and defines a processing space for processing the substrate. A vacuum pump is connected to at least one of the annular grooves to suck gas therefrom, with the surface of the head facing the substrate processing surface to create a high-level vacuum in the processing space. A focused ion beam column is equipped with a cylindrical chamber leading to the orifice. The chamber has disposed therein a focused ion beam optical system which emits a focused ion beam through the orifice. A precursor gas supply connects to the innermost annular groove to eject a precursor gas to flow into the processing space along the process surface.