The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Aug. 01, 2022
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Pai-Chi Chen, Pingtung County, TW;

Chian-Ting Huang, Tainan, TW;

Yung-Feng Cheng, Kaohsiung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/62 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06T 7/62 (2017.01); G06T 2207/30148 (2013.01);
Abstract

The present invention provides a photomask inspection method, including steps of defining an anchor ratio, providing a photomask and measuring the photomask to obtain a measured ratio, wherein the measured ratio is equal to a value of an image intensity extremum divided by an image intensity threshold or is equal to a value of the image intensity threshold divided by the image intensity extremum when the photomask is measured in an image measurement system tool for a specific critical dimension, and if the measured ratio is larger than the anchor ratio, the photomask is regarded as passing the inspection, and if the measured ratio is smaller than the anchor ratio, the photomask is regarded as failing the inspection.


Find Patent Forward Citations

Chen, Pai-Chi. (2026). Photomask inspection method using image inensity ratio (U.S. Patent No. 12536645). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12536645

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