The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Feb. 22, 2023
Applicant:

SK Siltron Co., Ltd., Gumi-si, KR;

Inventor:

Jung Won Shin, Gumi-si, KR;

Assignee:

SK SILTRON CO., LTD., Gumi-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06V 10/74 (2022.01); G06V 10/82 (2022.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06V 10/761 (2022.01); G06V 10/82 (2022.01);
Abstract

A device for evaluating edge defects in a silicon wafer comprises an image acquiring unit configured to acquire image data of an edge region of the silicon wafer, a data preprocessing unit configured to measure an edge region of the silicon wafer using a measurement equipment when an edge defect is detected in the acquired image data to determine a defect attribute of the detected edge defect, and a processor. The processor controls to learn the acquired image data to output a defect attribute corresponding to the detected edge defect, and verifies an accuracy of the output defect attribute of the edge defect based on the determined defect attribute of the edge defect.


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