The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Dec. 07, 2023
Snap Inc., Santa Monica, CA (US);
Alexander Drayton, Abingdon, GB;
Marcell Kiss, Didcot, GB;
Parashara Panduranga, Banbury, GB;
Jamie Dean Reynolds, Abingdon, GB;
Cheng Shi, Didcot, GB;
Snap Inc., Santa Monica, CA (US);
Abstract
In a thin film stack deposited on a substrate, a first layer can have a non-uniform thickness. A second layer, disposed so that the first layer is between the substrate and the second layer, can have a non-uniform thickness. A first pattern can be formed on the second layer to define first areas. The second layer can be etched in the first areas to form first holes having varying depths. A second pattern can be formed on the first layer in the first holes to define second areas. Each second area can be smaller than a corresponding first area. The first layer can be etched in the second areas to form second holes having varying depths. An imprint of the etched thin film stack can be formed such that the first holes and the second holes form a plurality of diffractive elements having varying sizes on the imprint.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile