Wafer scale active thermal interposer for device testing

Abstract

An apparatus for use in testing an integrated circuit semiconductor wafer device under test (wafer DUT) includes a probe configured to probe a surface of the wafer DUT during testing thereof, a thermal interposer (TI) including a heater layer arranged with a plurality of zones corresponding to a plurality of areas of the wafer DUT, the TI configured to come into proximity to a surface of the wafer DUT and further configured to selectively heat the plurality of areas by selectively heating the plurality of zones, the heater layer including a plurality of heating elements configured to correspond to the plurality of zones, and a plurality of temperature measurement devices configured to correspond to the plurality of zones, a cold plate disposed in proximity to the TI and configured to selectively cool the plurality of areas of the wafer DUT, and a thermal controller configured to control selective cooling of the cold plate and configured to control selective heating of the plurality of heating elements of the TI during the testing.