The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2026
Filed:
Jun. 09, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Barton Lane, Austin, TX (US);
Peter Lowell George Ventzek, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/321 (2013.01); H01J 37/32091 (2013.01); H01J 37/3244 (2013.01); H01J 37/32532 (2013.01); H01J 2237/06375 (2013.01); H01J 2237/2007 (2013.01);
Abstract
What is described is an equipment for plasma processing including: a pedestal configured to hold a wafer; concentric with the pedestal, a focus ring including an insulator, the focus ring being positioned close to an edge region of the wafer when the wafer is held on the pedestal; and a plurality of gas discharge devices embedded in the focus ring, where each gas discharge device is configured to generate a gas discharge plasma confined within the focus ring.