The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Jan. 13, 2022
Applicant:

SK Keyfoundry Inc., Cheongju-si, KR;

Inventor:

Yang Beom Kang, Cheongju-si, KR;

Assignee:

SK keyfoundry Inc., Cheongju-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 41/49 (2023.01); H10D 64/01 (2025.01);
U.S. Cl.
CPC ...
H10B 41/49 (2023.02); H10D 64/021 (2025.01);
Abstract

A manufacturing method of a non-volatile memory device, includes forming a floating gate on a substrate, depositing a first insulating layer on the floating gate, depositing a second insulating layer on the first insulating layer, depositing a third insulating layer on the second insulating layer, performing a first etch-back process on the third insulating layer to form a spacer-shaped third insulating layer on the second insulating layer, performing a second etch-back process on the second insulating layer to form a spacer-shaped second insulating layer on the first insulating layer, and performing a wet etching to remove the spacer-shaped third insulating layer to form a spacer-shaped first insulating layer and the spacer-shaped second insulating layer on the floating gate.


Find Patent Forward Citations

Kang, Yang. (2026). Manufacturing method of non-volatile memory device having uniform dielectric film profile (U.S. Patent No. 12526991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12526991

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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