The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Aug. 30, 2021
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
Wei-Chun Hsu, Hsinchu, TW;
Yung-Li Tsai, Miaoli County, TW;
Sheng-Wei Wu, Hsinchu County, TW;
Chih-Hao Chao, Hsinchu, TW;
Yu-Hao Huang, Hsinchu, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B 13/00 (2006.01); B08B 3/02 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); G05B 19/418 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
B08B 13/00 (2013.01); B08B 3/022 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); G05B 19/4183 (2013.01); G05D 7/0635 (2013.01); G05B 2219/41108 (2013.01); G05B 2219/45031 (2013.01);
Abstract
A semiconductor device manufacturing system and a method for manufacturing semiconductor device are provided. The semiconductor device manufacturing system includes a substrate processing device and a processor. The substrate processing device includes a processing chamber, a gas supply module and a gas source. The processor is configured to monitor and control the gas supplied into the substrate processing device.