The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Nov. 02, 2023
Nanchang University, Nanchang, CN;
International Institute of Food Innovation Co., Ltd., Nanchang University, Jiangxi, China, Nanchang, CN;
Jun Chen, Nanchang, CN;
Jialong Han, Nanchang, CN;
Taotao Dai, Nanchang, CN;
Lizhen Deng, Nanchang, CN;
Chengmei Liu, Nanchang, CN;
Wei Liu, Nanchang, CN;
Ruihong Liang, Nanchang, CN;
NANCHANG UNIVERSITY, Nanchang, CN;
INTERNATIONAL INSTITUTE OF FOOD INNOVATION CO., LTD., NANCHANG UNIVERSITY, JIANGXI, CHINA, Nanchang, CN;
Abstract
Provided are a high-pressure jet impact chamber structure, with an industrial-grade 'single orifice+single pulverizing chamber' design, and a multi-parallel type convenient pulverizing component adopted with the high-pressure jet impact chamber structure. The high-pressure jet impact chamber structure includes a body, a jet orifice, and a pulverizing chamber. The multi-parallel type convenient pulverizing component adopted with the high-pressure jet impact chamber structure includes a multi-parallel type chassis, a multi-parallel type connector disk, multiple high-pressure jet impact chamber structures that are parallel to each other, a sealing end cover, a discharge disk, and a discharge pipe.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile