The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Oct. 17, 2023
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventor:
Changyou Jing, Livermore, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01); G05B 19/418 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32724 (2013.01); G05B 19/418 (2013.01); H01J 37/3299 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/67248 (2013.01); C23C 16/50 (2013.01); G05B 2219/45031 (2013.01); H01J 37/32183 (2013.01); H01J 2237/332 (2013.01); H01J 2237/3343 (2013.01);
Abstract
Systems and methods for real-time control of temperature within a plasma chamber are described. One of the methods includes sensing a voltage in real time of a rail that is coupled to a voltage source. The voltage source supplies a voltage to multiple heater elements of the plasma chamber. The voltage that is sensed is used to adjust one or more duty cycles of corresponding one or more of the heater elements. The adjusted one or more duty cycles facilitate achieving and maintaining a temperature value within the plasma chamber over time.