The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Feb. 28, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventor:
Antti Juhani Niskanen, Helsinki, FI;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/4401 (2013.01); C23C 16/4412 (2013.01); C23C 16/45502 (2013.01); C23C 16/45536 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); H01J 37/32449 (2013.01); H01J 37/32477 (2013.01); H01J 37/32743 (2013.01); H01J 37/32788 (2013.01); H01J 2237/332 (2013.01);
Abstract
A gas-phase chemical reactor, a system including the reactor, and methods of using the reactor and system are disclosed. An exemplary reactor includes a reaction chamber and is configured to provide a precursor within the reaction chamber for a soak period—e.g., a period wherein a supply of the precursor to the reaction chamber is ceased and before purging of the reaction chamber begins. This allows relatively high residence times, relatively high partial pressures of the precursor(s) and/or a relatively high absolute pressure to be obtained within the reaction chamber during substrate processing.