The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Sep. 29, 2022
Applicant:

Sandisk Technologies Llc, Addison, TX (US);

Inventors:

Hiromi Minamitani, Yokkaichi, JP;

Kei Nozawa, Yokkaichi, JP;

Yusuke Yoshida, Yokkaichi, JP;

Assignee:

Sandisk Technologies, Inc., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); G11C 16/04 (2006.01); H01L 23/522 (2006.01); H01L 23/528 (2006.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 41/35 (2023.01); H10B 43/10 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); G11C 16/0483 (2013.01); H01L 23/5226 (2013.01); H01L 23/5283 (2013.01); H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/10 (2023.02); H10B 43/35 (2023.02);
Abstract

A three-dimensional memory device includes vertical layer stacks that are laterally spaced apart by backside trenches that laterally extend along a first horizontal direction, where each of the vertical layer stacks includes a respective alternating stack of insulating layers and electrically conductive layers, memory openings vertically extending through the alternating stacks, memory opening fill structures located in the memory openings and including a respective vertical stack of memory elements and a respective vertical semiconductor channel, and backside trench fill structures located within a respective one of the backside trenches. Each of the backside trench fill structures includes a plurality of dielectric bridge structures laterally spaced apart along the first horizontal direction and dielectric fin portions located at levels of a plurality of the electrically conductive layers. The dielectric fin portions laterally protrude outward relative to sidewalls of the insulating layers within the respective neighboring pair of alternating stacks.


Find Patent Forward Citations

Loading…