The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Jul. 18, 2023
Applicant:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Inventors:

Andreas Schmaunz, Oberkochen, DE;

Gero Walter, Westhausen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/305 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); H01J 37/244 (2013.01); H01J 2237/006 (2013.01); H01J 2237/317 (2013.01);
Abstract

While the sample is in a vacuum chamber of the particle beam system, a method comprises: processing the sample via an automatic supply in accordance with a process gas supply setting of at least one of a plurality of different process gases to the sample via a process gas supply device and via an activation of the supplied, at least one process gas by a particle beam of charged particles or a laser beam; measuring a property of the processed sample using a measuring device; modifying the process gas supply setting so that there is a change in a ratio of the quantities of the process gases to be supplied, on the basis of a measurement result obtained by the measurement; and continuing the processing of the sample using the modified process gas supply setting.


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