The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Jun. 29, 2022
Applicant:

Fei Company, Hillsboro, OR (US);

Inventors:

Nick Van Gestel, Eindhoven, NL;

Nick Verwimp, Eindhoven, NL;

Ruud Krijnen, Eindhoven, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G02B 21/28 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G02B 21/28 (2013.01); H01J 37/28 (2013.01);
Abstract

The invention relates to a sample holder for a microscopy system comprising a material with a low thermal conductivity for reducing a drift of the sample holder when inserted into a microscope. The invention also relates to a cold trap for a microscopy system comprising a sample holder, wherein the cold trap comprises a coating with a high thermal emissivity to increase a heat load between the sample holder and the cold trap. The invention also relates to a microscopy system comprising a first element configured to have a first temperature, a second element configured to have a second temperature, and a third element configured to have a third temperature, wherein the third element is configured to be located at a plurality of different distances from the first element, wherein the microscopy system is configured to image a sample and to reduce a drift of the image.


Find Patent Forward Citations

Loading…