The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Jan. 05, 2024
Kioxia Corporation, Tokyo, JP;
Hiroyuki Tanizaki, Nagoya Aichi, JP;
Kiminori Yoshino, Kuwana Mie, JP;
Kaori Fumita, Yokkaichi Mie, JP;
Hiroaki Shirakawa, Yokkaichi Mie, JP;
Manabu Takakuwa, Tsu Mie, JP;
Kentaro Kasa, Nagoya Aichi, JP;
Soichi Inoue, Yokkaichi Mie, JP;
Satoshi Tanaka, Yokohama Kanagawa, JP;
KIOXIA CORPORATION, Tokyo, JP;
Abstract
A measuring device includes a light source that irradiates a measurement spot on a wafer formed with memory holes and slits with a multi-wavelength light, a first imaging unit that acquires a first pupil plane intensity distribution image of reflected light from the measurement spot, a second imaging unit that acquires a second pupil plane intensity distribution image of the reflected light, and a detection unit that analyzes the second pupil plane intensity distribution image to measure overlay. The measuring device includes an overlay analysis unit that acquires the first and second pupil plane intensity distribution images while moving a position of the measurement spot and selects a measurement spot not including the slit based on the first pupil plane intensity distribution image, and uses the overlay obtained by analyzing the second pupil plane intensity distribution image of the selected measurement spot as the overlay of the memory hole and a slit.