The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Nov. 08, 2021
Applicant:
Resonac Corporation, Tokyo, JP;
Inventor:
Atsushi Suzuki, Tokyo, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/65 (2013.01); G01N 33/0027 (2013.01);
Abstract
There is provided a gas analyzing method capable of analyzing impurities in a sample gas with high accuracy by reducing the influence of water present in a gas cell. The gas analyzing method is a method for analyzing the impurities contained in the sample gas, and includes: a pretreatment step of reducing the partial pressure of water in a gas cell () into which the sample gas is introduced to 10 Pa or less; and an analysis step of introducing the sample gas into the gas cell () in which the pretreatment step has been carried out and detecting the impurities by Raman spectroscopy.