The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2025

Filed:

Feb. 10, 2022
Applicant:

Hine Automation, Llc, St. Petersburg, FL (US);

Inventors:

Wei-Hua Hsiao, St. Petersburg, FL (US);

Raj Subramanya, Oldsmar, FL (US);

Joseph Barraco, Lutz, FL (US);

Assignee:

HINE AUTOMATION, LLC, St. Petersburg, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B25J 9/10 (2006.01); B25J 9/16 (2006.01); B25J 11/00 (2006.01); B25J 19/02 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B25J 19/022 (2013.01); B25J 9/1015 (2013.01); B25J 9/1697 (2013.01); B25J 11/0095 (2013.01); H01L 21/67265 (2013.01); H01L 21/68707 (2013.01);
Abstract

A method for distinguishing between tilted and multi-stacked substrates in Automated Material-Handling Systems comprising the following steps. A substrate cassette having at least one substrate is provided. The substrate cassette is positioned within the material handling system. Each substrate has a top surface and a bottom surface. A first beam is emitted from a first emitter wherein the first beam is in optical communication with the top surface of the substrate. A second beam is emitted from a second emitter wherein the second beam is in optical communication with the bottom surface of the substrate. The first beam and the second beam are detected using at least one detector while vertically moving the substrate cassette relative to the first emitter or the second emitter.


Find Patent Forward Citations

Quick Actions:

Hsiao, Wei-Hua. (2025). Method for improved detection of anomalous substrates in automated material-handling systems (U.S. Patent No. 12508726). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12508726

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…