The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Jun. 22, 2023
Fei Company, Hillsboro, OR (US);
Alexander Henstra, Eindhoven, NL;
Galen Gledhill, Hillsboro, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
An ion beam system for modifying a sample or workpiece surface, comprises: an ion source for generating ions; an ion beam focusing column configured to direct ions from the ion source to form an ion beam and focus the ion beam towards a target area; and a sample stage for receiving and positioning the sample or workpiece at the target area, wherein the ion beam focusing column comprises: an aperture plate having a non-circular beam limiting aperture configured to limit the extent of a transmitted ion beam; and a multipole aberration compensator configured to apply a four-fold astigmatism to the ion beam to compensate spherical aberration produced by one or more lenses in the ion beam focusing column. The multipole aberration compensator may be a multipole element that generates an octupole field. A corresponding method is provided.