The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2025

Filed:

Feb. 23, 2023
Applicants:

Merck Patent Gmbh, Darmstadt, DE;

Versum Materials Us, Llc, Tempe, AZ (US);

Sigma-aldrich Co.llc, St. Louis, MO (US);

Inventors:

Christopher R. Clough, Plymouth, WI (US);

Christopher Jay Thode, Adell, WI (US);

Christopher David Hopkins, Carlsbad, CA (US);

Sergei V. Ivanov, Schnecksville, PA (US);

Agnes Derecskei, Fountain Hills, AZ (US);

Assignees:

Merck Patent GmbH, Darmstadt, DE;

Sigma-Aldrich Co., LLC, St. Louis, MO (US);

Versum Materials US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C07C 11/22 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/40 (2013.01); C07C 11/22 (2013.01); C23C 16/02 (2013.01); C23C 16/45525 (2013.01);
Abstract

Methods of using high-purity alkynes substantially free of residual alkyl halides, water and/or carboxylic acids and their use (e.g., in formulations) for enhanced passivation of metallic substrates.


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