The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Jul. 13, 2022
Tokyo Electron Limited, Tokyo, JP;
Makoto Kato, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus comprising: a plasma processing chamber; a substrate support disposed in the plasma processing chamber; a lower electrode disposed in the substrate support; a conductive member disposed above the substrate support, the conductive member having at least one coolant inlet and at least one coolant outlet, the conductive member being connected to an RF potential or a DC potential; and an upper electrode assembly including: a conductive plate detachably connected to a bottom surface of the conductive member, the conductive plate having one or more coolant channels communicating with the at least one coolant inlet and the at least one coolant outlet; an electrode plate disposed below the conductive plate; and a conductive bonding sheet disposed between the electrode plate and the conductive plate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile