The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Nov. 09, 2021
Applicant:

Evatec Ag, Trübbach, CH;

Inventors:

Peter Horn, Mels, CH;

Edmund Schüngel, Buchs, CH;

Adrian Herde, Hombrechtikon, CH;

Assignee:

EVATEC AG, Trübbach, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/12 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); G01N 29/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
G01N 29/12 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/50 (2013.01); G01N 29/346 (2013.01); G01N 29/348 (2013.01); H01J 37/3244 (2013.01); H01J 37/32935 (2013.01); G01N 2291/0237 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/332 (2013.01); H01J 2237/3323 (2013.01);
Abstract

A measuring device for measuring parameters of a piezoelectric crystal onto which a thin film of material is deposited (under vacuum). The crystal includes two spaced-apart electrodes. A frequency generator is adapted to generate an oscillator signal at a specified output frequency. A measuring amplifier is adapted to apply the oscillator signal as a drive signal to one of the electrodes of the crystal and to provide a crystal output signal in response to the drive signal. A quadrature demodulator is adapted to down convert the crystal output signal and to provide an in-phase output signal and a quadrature output signal. A computation unit is adapted to determine one or more parameters of the crystal based on the in-phase output signal and the quadrature output signal. Furthermore, there is provided a corresponding measuring method as well as to thin-film deposition systems (including a vacuum chamber) with such a device and methods for controlling such systems.


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