The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Apr. 29, 2020
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Masashi Sakai, Tokyo, JP;

Shinichiro Katsuki, Tokyo, JP;

Kazuo Kobayashi, Tokyo, JP;

Yasunari Hino, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/12 (2006.01); C23C 16/32 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C30B 25/10 (2006.01); C30B 29/36 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C30B 25/12 (2013.01); C23C 16/325 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); C30B 25/10 (2013.01); C30B 29/36 (2013.01); H01L 21/02378 (2013.01); H01L 21/02529 (2013.01); H01L 21/0262 (2013.01); H01L 21/02634 (2013.01); H01L 21/67103 (2013.01); H01L 21/68757 (2013.01); H01L 21/68785 (2013.01);
Abstract

Provided are a silicon carbide epitaxial growth device capable of fostering epitaxial growth on a silicon carbide substrate. Mounting a wafer holder loaded with a silicon carbide substrate and a tantalum carbide member to a turntable in a susceptor, and supplying a growth gas, a doping gas, and a carrier gas into the susceptor by heating by induction heating coils placed around the susceptor, thereby epitaxial growth is fostered, and stable and proper device characteristics are obtained, moreover, the yield in a manufacturing step of the silicon carbide epitaxial wafer is significantly improved.


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