The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Feb. 23, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Tsutomu Fukunaga, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 53/017 (2012.01); B24B 37/005 (2012.01); G06T 7/00 (2017.01); H04N 23/56 (2023.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
B24B 37/005 (2013.01); B24B 53/017 (2013.01); G06T 7/0004 (2013.01); H04N 23/56 (2023.01); G06T 2207/20076 (2013.01); H01L 21/02057 (2013.01); H01L 21/30625 (2013.01);
Abstract
A substrate processing apparatus includes: a polishing pad that polishes a substrate; a pod that accommodates a polishing surface of the polishing pad, which is brought into contact with the substrate; an imaging unit that images the polishing surface of the polishing pad through the pod; and an image processing unit that processes image data imaged by the imaging unit to detect deterioration of the polishing pad.