The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Aug. 11, 2023
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Jacob L. Hiester, Beaverton, OR (US);

Richard Blank, Fremont, CA (US);

Peter Thaulad, Fremont, CA (US);

Paul Konkola, West Linn, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/66 (2006.01); H01L 21/677 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67259 (2013.01); H01J 37/32724 (2013.01); H01L 21/67161 (2013.01); H01L 21/67201 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/67742 (2013.01); H01L 21/67748 (2013.01); H01L 21/68 (2013.01); H01L 21/681 (2013.01); H01L 21/68742 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 22/20 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/334 (2013.01); H01L 21/6831 (2013.01);
Abstract

A method for calibration including determining a temperature induced offset in a pedestal of a process module under a temperature condition for a process. The method includes delivering a wafer to the pedestal of the process module by a robot, and detecting an entry offset. The method includes rotating the wafer over the pedestal by an angle. The method includes removing the wafer from the pedestal by the robot and measuring an exit offset. The method includes determining a magnitude and direction of the temperature induced offset using the entry offset and exit offset.


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