The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Jan. 25, 2024
Kla Corporation, Milpitas, CA (US);
Vladimir Levinski, Migdal HaEmek, IL;
Andrew V. Hill, Sunriver, OR (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system may include a controller to receive two or more images of the overlay target from one or more detectors of an optical sub-system, the overlay target including first and second periodic features generated with different measurement conditions, each measurement condition associated with at least one of a sample focal distance or a configuration of diffraction orders of the illumination by the overlay target that contributes to the associated image. The controller may further calculate an amplitude asymmetry associated of opposing diffraction orders of the illumination by the overlay target based on the two or more images and one or more quality metrics associated with the overlay target based on the amplitude asymmetry.