The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Apr. 10, 2024
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
An-Ren Zi, Hsinchu, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Ching-Yu Chang, Yuansun Village, TW;
Yahru Cheng, Taipei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); H01L 21/027 (2006.01); H01L 21/47 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/32 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); H01L 21/0273 (2013.01); H01L 21/47 (2013.01);
Abstract
A photoresist developer includes a solvent having Hansen solubility parameters of 15<δ<25, 10<δ<25, and 6<δ<30; an acid having an acid dissociation constant, pKa, of −15<pKa<4, or a base having a pKa of 40>pKa>9.5; and a chelate.