The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Jan. 05, 2022
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Xiumei Liu, Fremont, CA (US);

Mark S. Wang, San Ramon, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G01B 11/27 (2006.01); G01B 21/04 (2006.01); G01N 21/17 (2006.01);
U.S. Cl.
CPC ...
G01N 21/4788 (2013.01); G01B 11/272 (2013.01); G01B 21/045 (2013.01); G01N 21/1717 (2013.01); G01N 2021/1785 (2013.01);
Abstract

An imaging system may include an imaging metrology tool with an illumination source, one or more illumination optics to direct illumination from the illumination source to a sample, a detector, one or more collection optics to image the sample onto the detector; and one or more aberration-controlling components. The one or more aberration-controlling components may provide aberration correction for imaging the sample onto the detector according to one or more degrees of freedom, where the one or more degrees of freedom include at least a defocus of the imaging system, and where the one or more aberration-controlling components are integrated with at least one of the one or more illumination optics, the one or more collection optics, or the detector.


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