The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Feb. 01, 2021
Tokyo Electron Limited, Tokyo, JP;
Takashi Fuse, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film formation method includes: a step of preparing a substrate including a layer of a first material formed on a surface in a first region, and a layer of a second material formed on a surface in a second region; a first SAM formation step of forming a first self-assembled monolayer in the first region by supplying a raw material gas for the first self-assembled monolayer, wherein the raw material gas corresponds to the first material; and a second SAM formation step for forming a second self-assembled monolayer including an organic acid group or a second self-assembled monolayer including a condensable group on top of the first self-assembled monolayer in the first region by supplying a first gas, which includes an organic acid group, while including a self-assembling molecule, or by supplying a second gas, which includes a condensable group, while including a self-assembling molecule.