The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Jun. 21, 2022
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Paz Yabbo, Gedera, IL;

Boaz Dudovich, Rehovot, IL;

Bhavna Ghai, Rehovot, IL;

Amir Bar, Rehovot, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G06N 3/08 (2023.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G06N 3/08 (2013.01); G06T 7/0004 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

There is provided a system and method of optimizing an inspection recipe for inspecting a semiconductor specimen. The method includes obtaining test data from a test performed after inspection, the test data indicative of functional defectivity of the specimen with respect to at least one structural feature at a suspected layer; retrieving inspection data of the suspected layer including a set of inspection images and a set of defect maps of the plurality of processing steps of the suspected layer; correlating the test data and the set of defect maps of the suspected layer to identify one or more structural features of the suspected layer with unmatched defectivity; for each of the identified structural features, including at least part of the inspection images corresponding to the structural feature in a training set; and using the training set to train a machine learning (ML) model in the inspection recipe.


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