The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Dec. 07, 2023
Carl Zeiss Microscopy Gmbh, Jena, DE;
Heiko Stegmann, Dresden, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
A method for creating a trench with a defined intended trench depth in a sample uses a particle beam system configured to create a particle beam to ablate material from the sample. An exemplary method comprises: defining a particle beam system setting which is a setting of the particle beam system for implementing an ablation unit step with the particle beam; acquiring calibration data records using the defined particle beam system setting on a calibration sample; determining a regression curve based on the acquired calibration data records, the regression curve being defined on the basis of at least one parameter that characterizes the ablation unit step; determining an implementation number based on the determined regression curve and the intended trench depth; and creating a trench in the sample by repeatedly implementing the ablation unit step with the particle beam system setting in accordance with the determined implementation number.