The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Aug. 16, 2021
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Lars Loetgering, Amsterdam, NL;
Stefan Michiel Witte, Hoofddorp, NL;
Christina Lynn Porter, Veldhoven, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/47 (2006.01); G01J 1/04 (2006.01); G01J 1/42 (2006.01); G01J 9/00 (2006.01); G01N 23/20 (2018.01); G01N 23/20025 (2018.01); G01N 23/2055 (2018.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/4788 (2013.01); G01J 1/0437 (2013.01); G01J 1/4257 (2013.01); G01J 9/00 (2013.01); G01N 23/20025 (2013.01); G01N 23/2055 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70681 (2023.05); G01N 2201/021 (2013.01);
Abstract
Disclosed is a wavefront sensor for measuring a wavefront of a radiation. The wavefront sensor comprises a mask comprising a pattern located in path of the radiation to interact with the radiation. The radiation impinging on the mask forms a radiation detection pattern on a radiation detector subsequent to the mask, and the pattern of the mask is designed at least partly based on a requirement of the radiation detection pattern.