The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Sep. 15, 2022
San Diego State University (Sdsu) Foundation, San Diego, CA (US);
Centro DE Investigaciones En Optica A.c., Guanajuato, MX;
Sungbum Kang, San Diego, CA (US);
Sotero Ordoñes Nogales, Guanajuato, MX;
SAN DIEGO STATE UNIVERSITY (SDSU) FOUNDATION, San Diego, CA (US);
CENTRO DE INVESTIGACIONES EN OPTICA A.C., Guanajuato, MX;
Abstract
In alternative embodiments, provided are moiré profilometry methods for analyzing a topography of an object comprising use of dual patterns that are simultaneously projected onto a surface of the object from two symmetric directions. In alternative embodiments, the projected dual patterns superimpose and generate a fringe pattern that contains a moiré pattern, the moiré pattern having a phase that is modulated according to the topography of the object. In alternative embodiments, the moiré pattern is extracted from the fringe pattern using a spatial or temporal method, and the phase is demodulated from the extracted moiré pattern using a spatial or temporal method.