The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Feb. 16, 2023
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Michael Eugene Givens, Oud-Heverlee, BE;

Eva Tois, Helsinki, FI;

Suvi Haukka, Helsinki, FI;

Daria Nevstrueva, Helsinki, FI;

Charles Dezelah, Helsinki, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/02 (2006.01); C23C 16/20 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/04 (2013.01); C23C 16/0281 (2013.01); C23C 16/20 (2013.01); C23C 16/45534 (2013.01); C23C 16/56 (2013.01); C23C 28/341 (2013.01);
Abstract

In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.


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